Wet chemical deposition of crystalline, redispersable ATO and ITO nanoparticles

Abstract

A new wet chemical concept to produce coatings by dip, spin or spray processes is presented. It is based on the preparation of solutions made of crystalline nanoparticles fully redispersable in a solvent. It is exemplified for the preparation of SnO2 : Sb (ATO) and In2O3 : Sn (ITO) transparent conducting coatings. The process combines the advantages of using particles having already a low resistivity and the possibility to sinter the coatings at low temperature. The particles are prepared using an in-situ monitoring of the surface energy to control the growth of the particles and to avoid their agglomeration. The dried powders can be fully redispersed in alcohol (ITO) or water (ATO). Single layers with thickness up to 200 nm (ATO) and 400 nm (ITO) have been fabricated. The sheet resistance of the coatings decreases with the sintering temperature. Typical values are 430 Ω(open square) for ATO (550°C) and 380 Ω(open square) for ITO (550°C). Sols made by redispersing the powders in organosilanes allow to produce coatings at low temperature with antistatic (R(open square) > 100 kΩ(open square)) and anti-glare properties (R(open square) > 100 kΩ(open square), 60 to 80 gloss units).