Please use this identifier to cite or link to this item: doi:10.22028/D291-24110
Title: Determinação do perfil de tensão em filmes finos por microelipsometria
Other Titles: Stress profile determination of thin films by microellipsometry
Author(s): De Albuquerque Barros Filho, D.
Aegerter, Michel A.
Language: (Other)
Year of Publication: 1993
OPUS Source: Anais / 37° Congresso Brasileiro de Cerâmica : Curitiba ; 22 a 25 de majo de 1993 / Associação Brasileira de Cerâmica. - Vol. 2. - São Paulo, SP : Associação Brasileira de Cerâmica, 1993, S. 860-867
SWD key words: Dünne Schicht
Photoelastischer Modulator
Kalibrieren <Messtechnik>
DDC notations: 500 Science
Publikation type: Conference Paper
Abstract: -
An optical system was developed to determine the stress profile of transparent thin films by measuring the phase difference between two electromagnetic waves produced by a photoelastic modulator. The system analysis is done by the Mueller matrix of each of its optical components. The calibration and stability of the system are also analyzed. The equipment measures retardation in the range of 1-1500 Å with a spatial resolution of 30 µm.
Link to this record: urn:nbn:de:bsz:291-scidok-23344
Date of registration: 22-Jul-2009
Faculty: SE - Sonstige Einrichtungen
Department: SE - INM Leibniz-Institut für Neue Materialien
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