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|Title:||Effect of Fluoride Treatment on the Acid Resistance of Hydroxyapatite|
|Publisher/Platform:||American Chemical Society (ACS)|
|Year of Publication:||2018|
|Publikation type:||Journal Article|
|Abstract:||The etching behavior of polycrystalline synthetic hydroxyapatite samples has been evaluated to explore the protective impact of fluoride on a tooth-like model system. Etching rates before and after fluoridation with a NaF solution at pH 6 were determined by atomic force microscopy. Despite a very low F concentration of ca. 0.2 atom % in the hydroxyapatite surface, a very strong effect on the acid resistance can be observed. Depending on the crystal orientation, etching in a NaAc buffer at pH 4.5 was completely inhibited for at least 5 min. The major part of the surface withstood etching even for more than 23 min. These results give new insights into how the amount of incorporated fluoride in hydroxyapatite correlates with its protective impact.|
|DOI of the first publication:||10.1021/acs.langmuir.8b03412|
|Link to this record:||hdl:20.500.11880/27777|
|Date of registration:||13-Sep-2019|
|Faculty:||NT - Naturwissenschaftlich- Technische Fakultät|
|Department:||NT - Physik|
|Professorship:||NT - Prof. Dr. Karin Jacobs|
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