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Titel: Improvement of photofatigue resistance of spirooxazine entrapped in organic-inorganic composite synthesized via the sol-gel process
Verfasser: Hou, Lisong
Mennig, Martin
Schmidt, Helmut K.
Sprache: Englisch
Erscheinungsjahr: 1994
Quelle: Sol-gel optics III : 25-27 July 1994, San Diego, California / John D. Mackenzie, chair/editor; sponsored by SPIE--The International Society for Optical Engineering. - Bellingham, Wash., USA : SPIE, 1994. - (SPIE proceedings series ; 2288), S. 328-339
SWD-Schlagwörter: Spirooxazine
Sol-Gel-Verfahren
Werkstoffpaarung
Photochromie
DDC-Sachgruppe: 620 Ingenieurwissenschaften und Maschinenbau
Dokumentart : InProceedings (Aufsatz / Paper einer Konferenz etc.)
Kurzfassung: A photochromic dye, spirooxazine (SO), was incorporated in organic-inorganic composite (OIC) materials by taking the advantages of sol-gel processing. It has been found that the photochromic respnonse is high enough and the fading rate is similar to the dye-in-ethanol solution while the photofatigue resistance is strongly dependent on the matrix composition and the starting compounds. In the present work, we present results on the effect of matrix composition and starting compounds as well as additives on the photofatigue resistance of SO-OIC photochromic coatings. Sol-gel coatings synthesized from methyltrimethoxysilane (MTMS) and glycidyloxypropyltrimethoxysilane (GPTMS) as starting compounds, and using 1H,1H,2H,2H-perfluoroslkyltrimethoxysilane (FAS) and 1-methylimidazole (MI) as additives provide the SO dye with a favourable matrix environment in terms of photofatigue, sothat the overall photochromic performance of the dye can be optimized. The photofatigue resistance reaches the same level as, while both the photochromic response and fading rate are much better than the SO-PMMA coatings.
Link zu diesem Datensatz: urn:nbn:de:bsz:291-scidok-27620
hdl:20.500.11880/24507
http://dx.doi.org/10.22028/D291-24451
ISBN der Druckausgabe: 0-8194-1612-6
SciDok-Publikation: 11-Mär-2010
Fakultät: Sonstige Einrichtungen
Fachrichtung: SE - INM Leibniz-Institut für Neue Materialien
Fakultät / Institution:INM
SE - Sonstige Einrichtungen

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