Please use this identifier to cite or link to this item: doi:10.22028/D291-24451
Title: Improvement of photofatigue resistance of spirooxazine entrapped in organic-inorganic composite synthesized via the sol-gel process
Author(s): Hou, Lisong
Mennig, Martin
Schmidt, Helmut K.
Language: English
Year of Publication: 1994
OPUS Source: Sol-gel optics III : 25-27 July 1994, San Diego, California / John D. Mackenzie, chair/editor; sponsored by SPIE--The International Society for Optical Engineering. - Bellingham, Wash., USA : SPIE, 1994. - (SPIE proceedings series ; 2288), S. 328-339
SWD key words: Spirooxazine
DDC notations: 620 Engineering and machine engineering
Publikation type: Conference Paper
Abstract: A photochromic dye, spirooxazine (SO), was incorporated in organic-inorganic composite (OIC) materials by taking the advantages of sol-gel processing. It has been found that the photochromic respnonse is high enough and the fading rate is similar to the dye-in-ethanol solution while the photofatigue resistance is strongly dependent on the matrix composition and the starting compounds. In the present work, we present results on the effect of matrix composition and starting compounds as well as additives on the photofatigue resistance of SO-OIC photochromic coatings. Sol-gel coatings synthesized from methyltrimethoxysilane (MTMS) and glycidyloxypropyltrimethoxysilane (GPTMS) as starting compounds, and using 1H,1H,2H,2H-perfluoroslkyltrimethoxysilane (FAS) and 1-methylimidazole (MI) as additives provide the SO dye with a favourable matrix environment in terms of photofatigue, sothat the overall photochromic performance of the dye can be optimized. The photofatigue resistance reaches the same level as, while both the photochromic response and fading rate are much better than the SO-PMMA coatings.
Link to this record: urn:nbn:de:bsz:291-scidok-27620
ISBN: 0-8194-1612-6
Date of registration: 11-Mar-2010
Faculty: SE - Sonstige Einrichtungen
Department: SE - INM Leibniz-Institut für Neue Materialien
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