Please use this identifier to cite or link to this item: doi:10.22028/D291-23831
Title: A simple model for stress voiding in passivated thin film conductors
Author(s): Lloyd, J. R.
Arzt, Eduard
Language: English
Year of Publication: 1992
OPUS Source: Materials reliability in microelectronics II : symposium held April 27 - May 1, 1992, San Francisco, California, U.S.A. / ed.: C. V. Thompson ... - Pittsburgh, Pa. : Materials Research Society, 1992. - (Materials Research Society symposium proceedings ; 265), S. 45-50
SWD key words: Beanspruchung
DDC notations: 620 Engineering and machine engineering
Publikation type: Conference Paper
Abstract: A model is proposed for stress voiding in passivated thin film conductors. The rate limiting step is argued to be the formation of vacancies at dislocation jogs which then diffuse to void sites.
Link to this record: urn:nbn:de:bsz:291-scidok-17869
ISBN: 1-558-99160-3
Date of registration: 3-Dec-2008
Faculty: SE - Sonstige Einrichtungen
Department: SE - INM Leibniz-Institut für Neue Materialien
SciDok - Der Wissenschaftsserver der Universität des Saarlandes

Files for this record:
File Description SizeFormat 
ea199210.pdf1,59 MBAdobe PDFView/Open

Items in SciDok are protected by copyright, with all rights reserved, unless otherwise indicated.